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  • Atomic Layer Deposition System

    Posted by PressReleases - July 1, 2011 23:14

    Kurt J. Lesker's new Atomic Layer Deposition system, the ALD 150LX, can operate as a stand-alone or fully integrated cluster tool system. Typical applications include: Nanofabrication, Microelectronics, Optics, MEMS, Semiconductor, Photovoltaics, Photonics, Catalysis & Fuel Cells, Wear Resistance and OLED/Organic electronics.  The ALD 150LX offers full process control, integrated pumping, pressure management and gas delivery packages that can be optimised to suit your specific process.

     

    Features include: 

     

    - Proprietary perpendicular flow reactant delivery for short cycle times and efficient reactant utilization

    - High throughput, centrally pumped for enhanced uniformity and reactant dispersion

    - Expandable LVP, HVP precursor delivery for multiple ALD layer deposition including metals, oxides and nitride layers.

    - Substrate heating to 500°C enables a wide range of ALD research

    - Heated chamber walls, delivery lines and pumping lines to prevent unwanted deposition and increase precursor utilization.

    - Up to 6” Diameter Wafer (smaller substrates via adaptors)

    - Optional Load Lock

    - Optional Remote Inductively Coupled Plasma Source

    - Fully enclosed framework and stand-alone electronics/control console

    - In-situ monitoring via standard ellipsometry ports.

    - Scalable design allows for easy expansion and cluster tool integration

     

    John Morris Scientific’s factory trained staff will deliver, install and provide onsite user training. Preventative maintenance and extended warranty agreements are also available.

     

    For further information on the ALD-150LX, please contact customer service on 1800 251 799 or email info@johnmorris.com.au



    Tags: nanofabrication, microelectronics, optics, mems, semiconductor, photovoltaics, photonics, catalysis cells, fuel cells, wear resistance, oled, organic electronics, atomic layer deposition system, kurt j lesker

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    Thin Film Deposition System

    Posted by PressReleases - July 1, 2011 22:05

    Kurt J. Lesker's new thin film deposition system, the NANO 36, has been designed to accommodate most thermal evaporation processes and magnetron sputtering (including: RF, DC and pulsed DC). It is an economical option for entry to mid-level users in university, industrial and government R&D laboratories.

     
    This compact (1270mm X 940mm 1727mm) and portable system contains a range of features including:

     

    ·         4 x thermal evaporation sources with film thickness monitor or control package

    ·         Up to 8” Wafer

    ·         Magnetron sputter source option

    ·         12″ diameter X 18″ glass Pyrex bell jar with implosion guard (optional St Stl box chamber)

    ·         Turbomolecular high vacuum pumping system with dry backing pump

    ·         Substrate heating option

    ·         Manual colour touch-screen PC based process automation

     

    The NANO 36 is suitable for a variety of applications including:

    ·         Photovoltaics/Solar Cells

    ·         SEM/TEM Sample Prep

    ·         Organic LEDs

    ·         Organic PVs

    ·         Photonics/Sensors

    ·         Nanofabrication

    ·         Medical Devices

     

    John Morris Scientific’s factory trained staff will deliver, install and provide onsite user training. Preventative maintenance and extended warranty agreements are also available.

     

    For further information on the NANO 36, please contact customer service on 1800 251 799 or email info@johnmorris.com.au



    Tags: thin film deposition, magnetron sputtering, kurt j lesker

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    Kurt J. Lesker - Vacuum Technology

    Posted by PressReleases - September 21, 2009 19:21

     

     John Morris Scientific are delighted to announce they have been appointed as the new exclusive distributors for Kurt J. Lesker within Australia, New Zealand and the South West Pacific. Based in America with facilities in Europe and Asia, Kurt J. Lesker are a leader in design and manufacturing of vacuum technology solutions for research and production applications.

     

    Kurt J. Lesker manufacture a variety of products from the simplest components and fittings to complex vacuum chambers and precision computer-controlled deposition systems including:

     

    ·   Computer Controlled Deposition Systems

    ·   HV & UHV Chambers

    ·   System Sub-Assemblies

    ·   Torus® Circular & Linear Sputtering Cathodes

    ·   Flanges & Components

    ·   Feedthroughs (Electrical, Liquid/Gas, Motion and Optical)

     

    Kurt J. Lesker are known for their wide range of evaporation sources, deposition targets and materials. Their speciality is precious metals, where Kurt J. Lesker excel with world leading delivery times and conditions.

     

    Kurt J. Lesker also offer vacuum pumps, vacuum gauges and flow control equipment from all leading brands in the world.

     

    For more information on Kurt J. Lesker products please contact Vitali Polonski



    Tags: vacuum technology

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    Sputtering Targets & Sources

    Posted by PressReleases - August 16, 2009 12:40

    John Morris Scientific are pleased to introduce Kurt J. Lesker’s range of Sputtering Targets and Sources.

    Sputtering Deposition removes atoms/molecules from a solid target surface and transfers them onto a substrate surface under vacuum conditions. This process is used for coating optical films, architectural glass, semiconductors, medical instruments and other precise, thin-film applications.

    Kurt J. Lesker’s sputtering targets deliver the purity, density and homogeneity needed for superior results, in any material size or configuration. They come in a range of shapes (circular, planar, rectangular, delta, ring and conical) and sizes (discs up to 24”, rectangles up to 120” long and 0.01” - 3” thick). Over 150 different pure materials are available (from Aluminium to Zirconium Oxide).

    Kurt J. Lesker also offer a target bonding service which ensures the efficient thermal transfer and electrical conduction needed for high-power sputtering.

    Kurt J. Lesker’s Sputtering sources deliver exceptional target utilization, superior deposition rates and outstanding film uniformity. They are available in a range of sizes (2” and 3” diameter) and mounting configurations.



    Tags: sputtering targets

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